Atomic Layer Deposition System Savannah from Cambrige NanoTech
Atomic Layer Deposition (ALD) system offers precise control of depositions down to the atomic scale. ALD is renowned for its film quality. The principle of ALD is based on sequential pulsing of special precursor vapors, each of which forms about one atomic layer each pulse. Cambridge NanoTech systems, such as the Savannah, are designed to deposit pinhole free coatings that are perfectly uniform in thickness, even deep inside pores, trenches and cavities.
The ability to deposit such high quality films on substrates with ultra-high aspect ratios. The deposition can be described by the following steps:
For thicker films, repeat the cycle several times.
FEATURES:
ALD provides digital thickness control to atomic level since the film is deposited one atomic layer at a time.
Pinhole free films, even over very large areas.
Low defect density and uniform coatings.
ALD makes amorphour or crystalline films, depending on substrate and temperature.
Digital control of sandwiches, heterostructures, laminates, mixed oxides, graded index layers and doping.
Insensitive to dust (grows underneath dust).
The equipment makes a lot of kinds films (oxides, nitrides, metals, semiconductors,...).
Excellent adhesion in a lot of substrates (even teflon) due to chemical bonds at the first layer.
Phone: (+34) 935 801 853
Email:
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Tlf.: (+34) 935 801 853; ext. 363/335 |
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Tlf.: (+34) 935 801 853; ext. 364/335 |
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Tlf.: (+34) 935 801 853; ext. 365/335 |
